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Nano-in Coater (Release Agent Application Device) Rotation-able Tank + with Ultrasonic Cleaning Cistern NIC-1510
Small lot production / release agent application device specifications /
This device is the equipment which can apply maximum three kinds of coating liquid to a wafer in 250 φ - 300φ and/or a piece of metal plate. In addition, as to exchange each tank is simple & easy, it is suitable to apply and/or to evaluate many different coating liquids.
The ultrasonic cleaning cistern was installed in the first tank, so it became to enable the driving such as washing, coating, rinse/conditioner as well.
| Main Specifications | |
|---|---|
| Stroke | 320mm |
| Object Size | φ250 t0.3 |
| Object Material | Wafer, Metal Sheet |
| Dip Speed | From 0.1mm/sec. to 60mm/sec. |
| Circulation Device of Coating Liquid | Not Including |
| Temperature Control of Coating Liquid | Not Including |
| Filter Mesh | Not Including |
| Drying Device | Not Including |
| Dry Temperature | Not Equipped |
| HEPA (High Efficiency Particulate Air Filter) Unit | Not Including |
| Device Dimension (approx. size) | W:1100×D:975×H:1410mm |
