Nano-in Coater (Release Agent Application Device) Rotation-able Tank + with Ultrasonic Cleaning Cistern NIC-1510
Small lot production / release agent application device specifications /
This device is the equipment which can apply maximum three kinds of coating liquid to a wafer in 250 φ - 300φ and/or a piece of metal plate. In addition, as to exchange each tank is simple & easy, it is suitable to apply and/or to evaluate many different coating liquids.
The ultrasonic cleaning cistern was installed in the first tank, so it became to enable the driving such as washing, coating, rinse/conditioner as well.
Main Specifications | |
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Stroke | 320mm |
Object Size | φ250 t0.3 |
Object Material | Wafer, Metal Sheet |
Dip Speed | From 0.1mm/sec. to 60mm/sec. |
Circulation Device of Coating Liquid | Not Including |
Temperature Control of Coating Liquid | Not Including |
Filter Mesh | Not Including |
Drying Device | Not Including |
Dry Temperature | Not Equipped |
HEPA (High Efficiency Particulate Air Filter) Unit | Not Including |
Device Dimension (approx. size) | W:1100×D:975×H:1410mm |